Modes of rf capacitive discharge in low-pressure sulfur hexafluoride
dc.contributor.author | Lisovskiy, V. | |
dc.contributor.author | Booth, Jean-Paul | |
dc.contributor.author | Jolly, J. | |
dc.contributor.author | Martins, S. | |
dc.contributor.author | Landry, K. | |
dc.contributor.author | Douai, D. | |
dc.contributor.author | Cassagne, V. | |
dc.contributor.author | Yegorenkov, V. | |
dc.date.accessioned | 2010-11-17T18:16:08Z | |
dc.date.available | 2010-11-17T18:16:08Z | |
dc.date.issued | 2007-11 | |
dc.description.abstract | This paper presents the results of an experimental study of rf capacitive discharge in low-pressure SF6. The rf discharge in SF6 is shown to exist not only in weak-current (α-) and strong-current (γ -) modes but also in a dissociative δ-mode. This δ-mode is characterized by a high degree of SF6 dissociation, high plasma density, electron temperature and active discharge current, and it is intermediate between α- and γ -modes. The δ-mode appears due to a sharp increase in the dissociation rate of SF6 molecules via electron impact starting after a certain threshold value of rf voltage. At the same time the threshold ionization energy of SFx (x = 1–5) radicals formed is below the ionization potential of SF6 molecules. The double layer existing in the anode phase of the near-electrode sheath is shown to play an important role in sustaining the α- mode as well as the δ-mode but it is not a cause of the rf discharge transition from α- to δ-mode. | en |
dc.description.sponsorship | - | en |
dc.identifier.citation | J. Phys. D: Appl. Phys. 40 (2007) 6989–6999 | en |
dc.identifier.uri | https://ekhnuir.karazin.ua/handle/123456789/1698 | |
dc.language.iso | en | en |
dc.publisher | JOURNAL OF PHYSICS D: APPLIED PHYSICS | en |
dc.relation.ispartofseries | ;doi:10.1088/0022-3727/40/22/020 | |
dc.subject | plasma physics | en |
dc.subject | gas discharges | en |
dc.title | Modes of rf capacitive discharge in low-pressure sulfur hexafluoride | en |
dc.type | Article | en |
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