Modes of rf capacitive discharge in low-pressure sulfur hexafluoride

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dc.contributor.authorLisovskiy, V.
dc.contributor.authorBooth, Jean-Paul
dc.contributor.authorJolly, J.
dc.contributor.authorMartins, S.
dc.contributor.authorLandry, K.
dc.contributor.authorDouai, D.
dc.contributor.authorCassagne, V.
dc.contributor.authorYegorenkov, V.
dc.date.accessioned2010-11-17T18:16:08Z
dc.date.available2010-11-17T18:16:08Z
dc.date.issued2007-11
dc.description.abstractThis paper presents the results of an experimental study of rf capacitive discharge in low-pressure SF6. The rf discharge in SF6 is shown to exist not only in weak-current (α-) and strong-current (γ -) modes but also in a dissociative δ-mode. This δ-mode is characterized by a high degree of SF6 dissociation, high plasma density, electron temperature and active discharge current, and it is intermediate between α- and γ -modes. The δ-mode appears due to a sharp increase in the dissociation rate of SF6 molecules via electron impact starting after a certain threshold value of rf voltage. At the same time the threshold ionization energy of SFx (x = 1–5) radicals formed is below the ionization potential of SF6 molecules. The double layer existing in the anode phase of the near-electrode sheath is shown to play an important role in sustaining the α- mode as well as the δ-mode but it is not a cause of the rf discharge transition from α- to δ-mode.en
dc.description.sponsorship-en
dc.identifier.citationJ. Phys. D: Appl. Phys. 40 (2007) 6989–6999en
dc.identifier.urihttps://ekhnuir.karazin.ua/handle/123456789/1698
dc.language.isoenen
dc.publisherJOURNAL OF PHYSICS D: APPLIED PHYSICSen
dc.relation.ispartofseries;doi:10.1088/0022-3727/40/22/020
dc.subjectplasma physicsen
dc.subjectgas dischargesen
dc.titleModes of rf capacitive discharge in low-pressure sulfur hexafluorideen
dc.typeArticleen

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Наукові роботи. Навчально-науковий інститут "Фізико-технічний факультет"